A glow discharge is a plasma formed by the passage of electric current through a gas. The optical actionometry of sputtered atoms is not. The common starting point for these mechanisms is a glow discharge plasma wherein charged species positive and negative ions and electrons, radicals, and neutrals constitute the gaseous etching environment. Sputtering effects can arise in two contexts within a dryetch process. Use features like bookmarks, note taking and highlighting while reading glow discharge processes. Surfaces of polyethylene and polyimide films were treated in nh 3 and n 2 plasma using dual. Glow discharge plasma treatment for surface cleaning and. Sputtering and plasma etching enter your mobile number or email address below and well send you a link to download the free kindle app. It is created by applying a voltage between two metal electrodes in a.
Lecture 7 dry etching techniques national tsing hua. Dry etching is an important process for micro and nanofabrication. Whether youve loved the book or not, if you give your honest and detailed thoughts then people will find new books that are right for them. Develops detailed understanding of the deposition and etching of materials by sputtering discharge, and of etching of materials by chemically active discharge.
Low frequency dry etching process of sio2 on gaas substrates was investigated with different etch gases. Glow discharge plasma properties of gases of environmental. Plasma etching techniques are typically classed by the configuration of the electrodes. Download it once and read it on your kindle device, pc, phones. The relation between the voltage required to strike the glow discharge and the plasma. Treats glow discharge at several levels from basic phenomena to industrial applicationspractical techniques diligently related to fundamentals. Plasma etching is the method of using a high energy plasma to selectively remove material from a surface. Dc glow discharge can only generate extremely weak plasma, which happens to be suitable for surface treatment of fragile holey carbon grids. Plasma etching is a form of plasma processing used to fabricate integrated circuits. Sputter deposition processes connecting repositories. Brian chapman glow discharge processes free ebook download as pdf file. The plasma source, known as etch species, can be either charged or neutral atoms and radicals. Plasma glow discharge inside pvd coating machine chamber. A glow discharge is a plasma formed by the passage of electric current through a lowpressure gas.
Each of the substrates is provided on the ground electrodes which are placed over each of the rfelectrodes in parallel to each other. Study of plasma and ion beam sputtering processes m. Plasma etching of semiconductors and various plasma deposition processes emerged as major. A glowdischarge decomposition apparatus comprises ground electrodes, substrates, rfelectrodes, a rfpower supply, a matching circuit and a controlling circuit having at least one electric element. Get your kindle here, or download a free kindle reading app. The most common plasma etch configurations are reactive ion etch rie, planar etch pe, inductively coupled plasma etch icp etch, or deep reactive ion etch drie etch. Plasma etching techniques including rie, pe, icp, and drie.
Also plasma assisted etching techniques and plasma polymerization are extensively used in many industrial processes. It is often created by applying a voltage between two electrodes in a glass tube containing a lowpressure gas. Comparative investigation on the characteristics of glow discharge plasma using glow discharge mass spectrometry and glow discharge optical emission spectrometry. Rack university of tennessee terminology etching the process by which material is removed from a surface mask layer used to protect regions of. The merits of such treatments are, however, strongly dependent on the process parameters. Effect of gas pressure and flow rate on the plasma power. Sputtering in a glow discharge for spectrochemical analysis. This chapter starts with the basics of plasma and goes on to describe the dry etching reaction processes and the mechanism of anisotropic etching without relying on mathematical equations or difficult theories, in a way that is completely accessible to readers who have no background in dry etching. The one atmosphere uniform glow discharge plasma oaugdpa platform.
Glow discharge processes 1980 edition open library. During the process, the plasma generates volatile etch products at room temperature from the chemical. Subjects range from voltage, distributions encountered in plasma etching systems to. Glow discharge has been used by many cryoem microscopist to treat the tem grids and make the surface hydrophilic. Mix of sputter and plasma etching by adjusting gas constituents and flow rates, and rf power and dc bias, we can. Glow discharge phenomena in plasma etching and plasma deposition. Then you can start reading kindle books on your smartphone, tablet, or computer no kindle device required. Glowdischarge sputtering means the energetic particles used to strike target is generated by glow discharge. Sputtering effects can arise in two contexts within a dry etch process. The inelastic processes undergone by the species in the sheath determine the energy and angular distributions of the sputtering fluxes that reach the cathode in a glow discharge, and also.
Emission spectroscopic studies of sputtering in a lowpower glow discharge. Plasma etching 3 also uses equipment similar to that used for plasma. Depending on the gas mixture, a chemical reaction or sputter etch process occurs at the surface of a substrate. A simplified theoretical expression has been developed for a glow discharge to show how the average cathode erosion rate expressed as the number of atoms per ion of the total bombarding flux varies with primary sputter yield, pressure, diffusion length and sputtered atom stopping cross section. The one atmosphere uniform glow discharge plasma oaugdpa platform technology for the 21st century. The mechanisms of reactive ion etching are discussed by flamm et al. Jan 26, 2006 cathode sputtering by glow discharge plasma is the effective solid etching. Sputtering and plasma etching 9780471078289 by chapman, brian and a great selection of similar new, used. Gas discharge plasmas and their applications citeseerx. Glow discharge phenomena in plasma etching and plasma.
Sputtering and plasma etching kindle edition by brian chapman. Sputtering and plasma etching brian chapman 1980 chichester. Amongst sputtering and plasma etching folks, the words plasma and glow discharge tend to be used synonymously to the horror of plasma physicists, im sure. Physics of glow discharge plasmas and plasmasurface. Download product flyer is to download pdf in new tab. Sputtering and plasma etching kindle edition by chapman, brian. A plasma creates ions, and neutral species that are drawn to a biased electrode. Argon sputter etching is a purely physical process anisotropy 1 selectivity 1 to get more selectivity we need chemistry. Develops detailed understanding of the deposition and etching of.
The present disclosure relates to an apparatus and method utilizing double glow discharge for sputter cleaning of a selected surface. Incoming ions cause removal of volatile products that arise from the interaction between the dry etch plasma and the surface to be etched. Download it once and read it on your kindle device, pc, phones or tablets. Applications and limitations of optical spectroscopy for process control, as well as for more fundamental investigations, of glow discharge sputter deposition and emission spectroscopies allows the determination of concentrations and spatial distributions of sputtered and background gas species in ground, metastable, ionized, and excited states. Effect of operation parameters on the sputtering and emission processes in radiofrequency glow discharge. Glow discharge sputtering of chromium and niobium disk cathodes in argon. Tube filled with argon, neutral, no charged particales between cathode and anode elastic collision, no energy exchange inelastic collision. Schematic overview of the basic plasma processes in a glow. Glow discharge sputtering means the energetic particles used to strike target is generated by glow discharge. The undesirable reaction of the reactive gas with the target material. Subjects range from voltage, distributions encountered in plasma etching systems to plasma. Abdelrahman accelerators and ion sources department, nuclear research center, atomic energy authority, 759 inchas, atomic energy, cairo, egypt abstract. This option allows users to search by publication, volume and page selecting this option will search the current publication in context. Etching different etching processes are selected depending upon the particular material to be removed.
In order to improve the results in these application fields and, in general, to obtain a better understanding of the plasma processes, various modeling approaches for glow discharges, mainly for. Plasma etching 3 also uses equipment similar to that used for plasma deposition. It is formed when a cell, consisting of an anode and a cathode, is filled with a gas at low pressure e. Dry etching in low frequency plasma system springerlink. Generation and stabilization of glow plasma by discharge under atmospheric pressure are monitored by detection of the number of electric current pulses per onehalf cycle of an alternating voltage applied to a discharge device. Sputtering and plasma etching pdf brian chapman wileyinterscience develops detailed understanding of the deposition and. This popular technique forms the focus of this chapter. Optical actionometry of cathode material sputtered into. When the voltage exceeds a value called the striking voltage, the gas ionization becomes selfsustaining, and the tube glows with a colored light. One can get into semantic discussions and argue that some discharges are plasmas with two or three different groups of electrons each with a welldefined temperature. Selecting this option will search all publications across the scitation platform selecting this option will search all publications for the publishersociety in context. Optical spectroscopy for diagnostics and process control. Aug 30, 2017 plasma glow discharge inside pvd coating machine chamber.
Principle of the glow discharge and its use for mass spectrometry. The surface may include the inner surface of a hollow substrate such as a tube which inner surface may then be coated via magnetron sputter deposition. Chapmanglow discharge processessputtering and plasma etching. Incoming ions cause removal of volatile products that arise from the interaction between the dryetch plasma and the surface to be etched. A glow discharge decomposition apparatus comprises ground electrodes, substrates, rfelectrodes, a rfpower supply, a matching circuit and a controlling circuit having at least one electric element. Brian chapman glow discharge processes sputtering gases. The effects of plasma ions, electrons and other energetic particles are now widely used for substrate cleaning as well as. Even a rare gas glow discharge, which consists almost exclusively of chemically. Us5539303a method for monitoring atmospheric pressure glow. An electric glow discharge is a plasma formed by the passage of. Download pdf download citation view references email request permissions. Glow discharge processes sputtering and plasma etching. Open library is an initiative of the internet archive, a 501c3 nonprofit, building a digital library of internet sites and other cultural artifacts in digital form. Glow discharge processes, sputtering and plasma etching, john.
Using a mask, plasma etching can occur on the exposed areas of the substrate. The addition of reactive gases creates an additional effect of chemical. Dec 05, 2010 open library is an initiative of the internet archive, a 501c3 nonprofit, building a digital library of internet sites and other cultural artifacts in digital form. However, sputtering is not desirable when glow discharge is used for lighting, because it shortens the life of the lamp. The emission of optical lines by plasma is a complex process depending on gas used. In this work we have concentrated in a comparative study of the discharge parameters namely, the various temperatures and the electron density. Sputtering in a glow discharge for spectrochemical. Glow discharge processes sputtering and plasma etching by brian n. Rack university of tennessee plasma etching outline plasma vs. The right pressure for a sustainable plasma 10 mtorr the right cathode voltage so that the ions have the right energy for sputtering e ion 100 ev and v cath 25 kv the right angle for high sputter yield 6070 from normal the right substrate voltage and temperature for a clean film. Sputtering is useful when using spectroscopy to analyze the composition of the cathode, as is done in glow discharge optical emission spectroscopy. Other readers will always be interested in your opinion of the books youve read.